A comparative study on the crystallization behavior of electroless NiP and NiCuP deposits

作者：Huisheng Yu, Shou-Fu Luo, Yong-Rui Wang · 发表于：Surface and Coatings Technology · 年份：2001 · DOI：10.1016/s0257-8972(01)01345-7 · 被引用次数：117 · 研究领域：Electrodeposition and Electroless Coatings、Semiconductor materials and interfaces、Semiconductor materials and devices