Low-temperature (120°C) growth of nanocrystalline silicon films prepared by plasma enhanced chemical vapor deposition from SiCl4/H2 gases: Microstructure characterization

作者：L. Zhang, Jianping Gao, Jin Xiao, Liping Wen, Jinlong Gong, C. Sun · 发表于：Applied Surface Science · 年份：2011 · DOI：10.1016/j.apsusc.2011.11.068 · 被引用次数：20 · 研究领域：Thin-Film Transistor Technologies、Silicon Nanostructures and Photoluminescence、Silicon and Solar Cell Technologies