Carbon system syntheses on a chip by multiple microplasma CVD

作者：Tsuyohito Ito, Ken Katahira, Azusa Asahara, Sergei A. Kulinich, Kazuo Terashima · 发表于：Science and Technology of Advanced Materials · 年份：2003 · DOI：10.1016/j.stam.2003.09.016 · 被引用次数：6 · 研究领域：Plasma Diagnostics and Applications、Diamond and Carbon-based Materials Research、Metal and Thin Film Mechanics

Different carbon nitride films are deposited in this study using a multiple DC microplasma chemical vapor deposition apparatus, a socalled plasma chip. Numerical evidence is obtained for the high deposition rate. It probably results from the high density of microplasma demonstrated with a simulation of DC microplasma by the particle-in-cell-Monte Carlo collision method. Moreover, we propose an RF apparatus with a carbon film matrix for improvement of disposability of electrodes of the DC apparatus.