Migration and annihilation of non-equilibrium point defects in sputter deposited nanocrystalline alpha-Fe films

作者：S. Chakravarty, Miao Jiang, U. Tietze, D. Lott, Thomas Geue, Jochen Stahn, Harald Schmidt · 发表于：Acta Materialia · 年份：2011 · DOI：10.1016/j.actamat.2011.05.029 · 被引用次数：23 · 研究领域：Ion-surface interactions and analysis、Advanced Materials Characterization Techniques、Fusion materials and technologies