Scanning tunneling microscope to evaluate supersmooth surface roughness

作者：Jingchi Yu, Lantian Hou, Jinjia Wei, J. E. Yao, Jianlin Cao, Junyi Yu · 发表于：Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE · 年份：1992 · DOI：10.1117/12.130727 · 被引用次数：2 · 研究领域：Force Microscopy Techniques and Applications、Surface and Thin Film Phenomena、Adhesion, Friction, and Surface Interactions

Our group has developed a surface roughness measuring system for supersmooth optics based on scanning tunneling microscopy techniques, which includes the assessment of two dimensional and three dimensional surface roughness parameters. The system has been applied to topographic mapping of superpolished Si wafer coated with single layer Mo film. The measuring precision of measured Rms, Ra and P-V value, if expressed with standards deviation (sigma) s , is 0.06 nm, 0.05 nm and 0.19 nm, respectively, which has achieved atomic resolution.