Soft Lithography Using Acryloxy Perfluoropolyether Composite Stamps

作者：Tu T. Truong, Rongsheng Lin, Seokwoo Jeon, Hee Hyun Lee, Joana Maria, Anshu Gaur, Hua Feng, Ines Meinel, John A. Rogers · 发表于：Langmuir · 年份：2007 · DOI：10.1021/la062981k · 被引用次数：141 · 研究领域：Nanofabrication and Lithography Techniques、Advancements in Photolithography Techniques、Force Microscopy Techniques and Applications

This paper describes composite patterning elements that use a commercially available acryloxy perfluoropolyether (a-PFPE) in various soft lithographic techniques, including microcontact printing, nanotransfer printing, phase-shift optical lithography, proximity field nanopatterning, molecular scale soft nanoimprinting, and solvent assisted micromolding. The a-PFPE material, which is similar to a methacryloxy PFPE (PFPE-DMA) reported recently, offers a combination of high modulus (10.5 MPa), low surface energy (18.5 mNm(-1)), chemical inertness, and resistance to solvent induced swelling that make it useful for producing high fidelity patterns with these soft lithographic methods. The results are comparable to, and in some cases even better than, those obtained with the more widely explored material, high modulus poly(dimethylsiloxane) (h-PDMS).