Self-assembly of block copolymer thin films

作者：Julie N. L. Albert, Thomas H. III Epps · 发表于：Materials Today · 年份：2010 · DOI：10.1016/s1369-7021(10)70106-1 · 被引用次数：507 · 研究领域：Block Copolymer Self-Assembly、Polymer Surface Interaction Studies、Advanced Polymer Synthesis and Characterization

Block copolymers self-assemble on nanometer length scales, making them ideal for emerging nanotechnologies. Many applications (e.g., templating, membranes) require the use of block copolymers in thin film geometries (∼100 nm thickness), where self-assembly is strongly influenced by surface energetics. In this review, we discuss the roles of surface and interfacial effects on self-assembly, with a specific focus on confinement, substrate surface modification, and thermal and solvent annealing conditions. Finally, we comment on novel techniques for manipulating and characterizing thin films, motivating the use of gradient and high-throughput methods for gaining a comprehensive picture of self-assembly to enable advanced nanotechnologies.