Atomic Resolution of the Silicon (111)-(7×7) Surface by Atomic Force Microscopy

作者：Franz J. Gießibl · 发表于：Science · 年份：1995 · DOI：10.1126/science.267.5194.68 · 被引用次数：1194 · 研究领域：Force Microscopy Techniques and Applications、Mechanical and Optical Resonators、Advanced Materials Characterization Techniques

Achieving high resolution under ultrahigh-vacuum conditions with the force microscope can be difficult for reactive surfaces, where the interaction forces between the tip and the samples can be relatively large. A force detection scheme that makes use of a modified cantilever beam and senses the force gradient through frequency modulation is described. The reconstructed silicon (111)-(7x7) surface was imaged in a noncontact mode by force microscopy with atomic resolution (6 angstroms lateral, 0.1 angstrom vertical).