Zeqi Chen

机构：Chinese Academy of Sciences, Institute of Microelectronics, Institute of Microelectronics

发表论文 3 篇 · 总被引 199 次 · h-index 1

代表论文

• Overall energy model for preferred growth of TiN films during filtered arc deposition (1997 · Journal of Physics D Applied Physics · 被引 197)
• The Vth shift mechanism in MIFIS FeFET: A field-driven perspective (2025 · Applied Physics Letters · 被引 1)
• Effect of Top Al 2 O 3 Interlayer Thickness on Memory Window and Reliability of FeFETs With TiN/Al 2 O 3 /Hf 0.5 Zr 0.5 O 2 /SiO x /Si (MIFIS) Gate Structure (2025 · IEEE Transactions on Electron Devices · 被引 1)