Chi Xu

机构：Institute of Semiconductors, University of Chinese Academy of Sciences · ORCID：0000-0002-3374-1580

发表论文 75 篇 · 总被引 1153 次 · h-index 21

代表论文

• Quasicrystal metasurface for dual functionality of holography and diffraction generation (2024 · eLight · 被引 39)
• Development of in situ characterization techniques in molecular beam epitaxy (2024 · Journal of Semiconductors · 被引 19)
• Epitaxial growth of high-quality Ge layers on Si with Ge2H6 under UHV-CVD conditions (2023 · Semiconductor Science and Technology · 被引 9)
• Real‐Time Self‐Optimization of Quantum Dot Laser Emissions During Machine Learning‐Assisted Epitaxy (2025 · Advanced Science · 被引 8)
• Consistent optical and electrical determination of carrier concentrations for the accurate modeling of the transport properties of n-type Ge (2023 · Materials Science in Semiconductor Processing · 被引 8)
• Elucidating a proper framework for the determination of threading dislocation densities in semiconductor films: a comprehensive study based on Ge/Si(001) (2024 · Semiconductor Science and Technology · 被引 5)