Florian Schlachter

机构：AMO (Germany)

发表论文 12 篇 · 总被引 83 次 · h-index 5

代表论文

Multi-project wafer runs for electronic graphene devices in the European 2D-Experimental Pilot Line project (2025 · Nature Communications · 被引 21)
New Organic Photo-Curable Nanoimprint Resist ≪mr-NIL210≫ for High Volume Fabrication Applying Soft PDMS-Based Stamps (2017 · Journal of Photopolymer Science and Technology · 被引 12)
Liquid transfer nanoimprint replication on non-flat surfaces for optical applications (2012 · Microelectronic Engineering · 被引 12)
UV-NIL based nanostructuring of aluminum using a novel organic imprint resist demonstrated for 100nm half-pitch wire grid polarizer (2016 · Microelectronic Engineering · 被引 11)
Fabrication of MOSFETs by 3D soft UV-nanoimprint (2012 · Microelectronic Engineering · 被引 9)
Inkjetable and photo-curable resists for large-area and high-throughput roll-to-roll nanoimprint lithography (2014 · Journal of Micro/Nanolithography MEMS and MOEMS · 被引 5)