Xinxing Ban

机构：Henan University of Technology, Henan University of Engineering · ORCID：0000-0002-9715-9047

发表论文 26 篇 · 总被引 198 次 · h-index 8

代表论文

• Molecular simulation of ultrasonic assisted diamond grit scratching 4H-SiC single-crystal (2024 · Tribology International · 被引 42)
• Compound mechanical and chemical-mechanical polishing processing technique for single-crystal silicon carbide (2023 · Precision Engineering · 被引 31)
• Multifunctional cross-sensitive magnetic alginate-chitosan-polyethylene oxide nanofiber sensor for human-machine interaction (2024 · International Journal of Biological Macromolecules · 被引 19)
• Microscopic removal mechanism of 4 H-SiC during abrasive scratching in aqueous H2O2 and H2O: Insights from ReaxFF molecular dynamics (2024 · Tribology International · 被引 17)
• Scratching properties of 4H–SiC single crystal after oxidation under different conditions (2024 · Wear · 被引 15)
• Improvement and application of pad conditioning accuracy in chemical mechanical polishing (2018 · Optical Engineering · 被引 14)